Page 146 - Praxair - Specialty Gases and Equipment Reference Guide

Electronics

Gas Handling Systems and Process Gases

Gas Handling Systems
Praxair manufactures a complete line In addition, Praxair offers: Complete systems include:
of gas handling equipment featuring n Fast lead times – on systems n One, two, or three-cylinder gas
advanced technologies, including gas and parts cabinets
cabinets, panels and controllers. n Flexibility – standard panel designs n Valve manifold boxes that efficiently

Praxair’s UltraPurge and SurePurge can be customized cost-effectively distribute gas from a single source
™
™
cabinets and gas handling systems to meet your individual needs point to multiple use points
combine time-tested, proven compo- n Field service – professionals n Gas isolation boxes that safely iso-
nents designed to provide reliable gas experienced in system installation, late gases from process equipment Electronics
delivery, automatic purging, continuous predictive maintenance and repair n Bubbler and liquid delivery systems
monitoring and emergency shutdown n Safety – combines the latest n Bulk Specialty Gas Systems (BSGS)
for semiconductor process gases. safety features with high quality for high volume applications
components

UP6 Process Panel SurePurge 8100 UltraPurge 400 Gas Cabinet Series
™
™
Fully automatic switchover capability for System controller for gas cabinets and Praxair’s one-, two- and three-cylinder gas
uninterrupted gas flow. See page E •307 panels. See page E •307 for details. cabinets are reliable, easy to use, and are
for details. designed to operate safely.
See page E •306 for details.

Types of Semiconductor Process Gases
This table lists the primary process gases used for
electronic device fabrication. Other gases are also available.

Atmospheric/Purge Gases Silicon-Precursor Gases Etchant Gases
Argon (Ar) Dichlorosilane (SiH Cl 2 ) Boron Trichloride (BCl )
3
2
Helium (He) Disilane (Si H 6 ) Chlorine (Cl )
2
2
Hydrogen (H ) Silane (SiH ) Halocarbon-14 (CF )
2
4
4
Krypton (Kr) Silicon Tetrachloride (SiCl ) Halocarbon-23 (CHF )
4
3
Neon (Ne) Silicon Tetrafluoride (SiF ) Halocarbon-41 (CH F)
3
4
Nitrogen (N ) Trichlorosilane (SiHCl ) Halocarbon-116 (C F 6 )
3
2
2
Oxygen (O ) Trimethylsilane (CH ) 3 SiH) Halocarbon-218 (C F 8 )
3
3
2
Xenon (Xe) Halocarbon-C318 (C F 8 )
4
Dopant Gases Hydrogen Chloride (HCI)
Reactant Gases Arsine (AsH ) Nitrogen Trifluoride (NF )
3
Carbon Dioxide (CO ) Boron Trifluoride (BF and B F 3 ) Sulfur Hexafluoride (SF )
3
11
3
2
Ammonia (NH ) Diborane (B H 6 ) 6
3
2
Nitrous Oxide (N O) Germane (GeH )
2
4
Sulfur Dioxide (SO ) Phosphine (PH )
3
2
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