Page 148 - Praxair - Specialty Gases and Equipment Reference Guide
P. 148
Electronics
Excimer Laser Gas Mixtures
Laser Gas Mixtures for
DUV Lithography
KrF and ArF Fluorine/Krypton/Neon (248nm) Fluorine/Argon/Neon (193nm)
Praxair now offers active, fluorine Major Components Major Components
containing laser gas mixes for KrF F 2 0.9 - 1.0% F 2 0.9 - 1.0%
(248 nm) and ArF (193 nm) DUV Kr 1.2 - 1.3% Kr NA
lithography applications. Made in facto- Ar NA Ar 3.4 - 3.6%
ries dedicated to the electronics indus- Ne Balance Ne Balance
try, Praxair products meet the exacting Impurities (ppm/v) Impurities (ppm/v) Electronics
specifications of the world’s leading N 2 50 N 2 50
laser OEMs. Combined with Praxair’s O 2 25 O 2 25
unique rare gas production capabilities, HF/H 2 O 25 HF/H 2 O 25
our customers are assured of a secure CH 4 1 CH 4 1
and cost competitive source of these CO 2 5 CO 2 5
mixes. CO 1 CO 1
CF 4 2 CF 4 2
Key Benefits: SF 6 1 SF 6 1
n Compliant with all laser SiF 4 2 SiF 4 2
OEM specifications
n Secure raw material supply COF 2 2 COF 2 2
NF 3
1
1
NF 3
n Produced in plants designed for and He 8 He 8
dedicated to the electronics markets
n Made with tight tolerance mixing Xe 10 Xe 10
technology and high precision
analytical testing
KrF/ArF mix
Cylinder Valve Contents
44 liter – K CGA 679/DISS 728 6000 liters
49 liter – T CGA 679/DISS 728 7500 liters
KrNe and ArXeNe Krypton/Neon (248 nm) Argon/Xenon/Neon (193 nm)
Praxair Electronics has combined Major Components Major Components
its leading-edge precision mixture Kr (%) 1.25 ± 0.05 Ar (%) 3.5 ± 0.1
manufacturing technology with its Ne Balance Xe (ppm) 10 ± 2
captive rare gas production to offer Impurities (ppm) Ne Balance
a secure supply of excimer laser inert H 2 O < 0.5 Impurities (ppm)
gas in cost-effective, high volume O 2 < 0.5 H 2 O < 0.5
production. N 2 < 1.0 O 2 < 0.5
Praxair’s excimer laser products have CH 4 < 0.5 N 2 < 1.0
CH 4
< 0.5
CO
< 0.5
passed OEM certification, and are CO 2 < 0.5 CO < 0.5
available to support advanced photo- CF 4 < 0.5 CO 2 < 0.5
lithography applications.
He < 8.0 CF 4 < 0.5
Key Benefits: Xe < 1.0 He < 8.0
n OEM qualified
n Secure raw material supply
n Regional mixture production KrNe/ArXeNe
n High precision analytical
Cylinder Valve Contents
44 liter – K CGA 580/DISS 718 6000 liters
49 liter – T CGA 580/DISS 718 7500 liters
1-877-PRAXAIR www.praxairdirect.com D•147